发明名称 |
Gas assisted atomizing devices and methods of making gas-assisted atomizing devices |
摘要 |
Gas-assisted atomizing devices are provided that include liquid orifices, which release liquid, and gas orifices, which release gas to atomize the liquid into droplets. The atomizing devices are formed by at least a first layer and a second layer. The atomizing devices can include a gas supply network and a liquid supply network that supply gas and liquid to the gas and liquid orifices.
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申请公布号 |
US6352209(B1) |
申请公布日期 |
2002.03.05 |
申请号 |
US20000712832 |
申请日期 |
2000.11.13 |
申请人 |
CORNING INCORPORATED |
发明人 |
SKEATH PERRY R;SAYLOR JOHN R;ROVELSTAD AMY L |
分类号 |
B05B1/08;B05B7/00;B05B7/04;B05B7/08;B05B15/00;B05B17/06;C03B19/14;F23D11/10;(IPC1-7):B05B7/00 |
主分类号 |
B05B1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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