| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate washing device to shorten a work time during a foreign matter removing work, improve work efficiency, effect stable removal of a foreign matter, prevent the occurrence of remaining of a foreign matter, and besides suppress the increase of a work time. SOLUTION: The substrate washing device is provided with one sheet roll 8, around which one end of a polishing sheet 9, situated in a manner to enable contact with a liquid crystal panel 20 surface, is wound and the other sheet roll 8 to wind one sheet roll 8 and the polishing sheet 9 from the other end side. Further, a rotation means containing a motor 1, a belt 4, and a rotary shaft 5 is provided to rotate the polishing sheet 9 and a pair of the sheet rolls 8 on a basis of a liquid crystal panel 20. |
