| 摘要 |
PROBLEM TO BE SOLVED: To certainly support a substrate while achieving the compactification of a substrate washing apparatus with respect to a process flow direction and to avoid the remaining of foreign matter at the edge part of the substrate to enhance a product yield. SOLUTION: First, second and third rolls 15, 16 and 17, which rotate the substrate 4 in its peripheral direction in a vertical posture while prescribing the movement in the diameter direction thereof, are provided to the washing fixture 8 reciprocally moved between a treatment area 5a and a retraction area 5b. The first and the second rolls 15 and 16 are constituted so as to be rotationally driven by a drive motor 18 and a belt transmission mechanism 19, and the third roll 17 is supported in a freely shakable manner by the shaking arm 20 arranged to the washing fixture 8. A rotary brush 13 is supported in a cantilevered state and the axial dimention is set to a range from the radius of the substrate 4 to > the diameter thereof.
|
