| 摘要 |
PURPOSE: Provided is a lithographic apparatus including an irradiating device for supplying a radiation projection beam, a support structure for supporting a pattern application means for applying a pattern to the projection beam according to a desired pattern, a substrate table for holding a substrate, and a projection device for projecting the beam having the pattern applied thereto to a target part of the substrate. CONSTITUTION: Positions X, Y and Rx of a mask stage are measured with use of two optical encoder reading heads(10,11). Two optical encoder reading heads(10,11) is measured displacements in grid lattices(12,13) mounted on the mask stage. It is preferable that the gird lattices(12,13) be provided to a cut-away part of a mask table(MT) so as to be on the same plane as a pattern on a mask(MA) itself. A table position in another freedom of movement can be measured with use of a capacitive or an optical height sensor(HS).
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