METHOD FOR MANUFACTURING ALUMINUM FILM BY ION PLATING

摘要

PURPOSE: A method for manufacturing an aluminum film by ion plating is provided which improves cohesiveness, corrosion resistance and reliability of the film by controlling bias voltage impressed onto a substrate in an ion plating method using electron beam evaporation. CONSTITUTION: In a method for forming an aluminum film on a sample(11) mounted on the barrel(8) using an ion plating device comprising a vacuum chamber(1) in which a film is treated; a barrel(8) which is fixed onto the upper part of the vacuum chamber, and in which a sample is installed; an electron beam evaporation source(2) which is equipped at the lower part of the vacuum chamber that is oppositely directed to the barrel; a shutter(5) which is installed between the barrel and the electron beam evaporation source; a filament(4) and an ionization electrode(3) which are installed at one side of the electron beam evaporation source; and a sample heating unit(7) which is installed between the shutter and the barrel, the method for manufacturing an aluminum film by ion plating comprises the processes of depositing the sample again for 1 hour and 30 minutes by lowering the voltage as much as 50 to 100 V after depositing the sample for 30 to 60 minutes by impressing an initial voltage of around 300 to 600 V to the barrel; and ion plating the sample by heating the sample to 200 deg.C with the sample heating unit with a voltage of 40 to 70 V impressed to the ionization electrode, and a current of 400 to 800 mA impressed to the barrel.