发明名称 |
CLEAN ROOM FOR FABRICATING SEMICONDUCTOR |
摘要 |
PURPOSE: A clean room for fabricating a semiconductor is provided to improve transfer efficiency of a substrate in the clean room, by preparing a transfer unit and a temporary storage unit so that the efficiency of a stocker and an auto guided vehicle is improved. CONSTITUTION: The clean room is divided into a service region(12) and a process region(14) wherein manufacturing apparatuses are positioned in the service region and a process using the manufacturing apparatuses is performed in the process region. A high efficiency particulate air(HEPA) filter(16) supplies purified air to the inside of the clean room, installed on the ceiling of the clean room. The temporary storage unit(32) temporarily stores a substrate excepted from the process before the substrate is transferred to the outside of the clean room, installed in the HEPA filter in the process region. A transfer unit(30) transfers the substrate to the temporary storage unit, installed in the lower portion of the temporary storage unit.
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申请公布号 |
KR20020016087(A) |
申请公布日期 |
2002.03.04 |
申请号 |
KR20000049233 |
申请日期 |
2000.08.24 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUNG, JEON GYO;LEE, MIN HO |
分类号 |
H01L21/02;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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