发明名称 Wet treatment apparatus
摘要 A wet treatment apparatus includes a nozzle having an approximately rectangular introduction opening surface that is open toward a substrate to be treated and an approximately rectangular recovery opening surface that is open toward the substrate, these opening surfaces being flush with each other and disposed with the long side directions thereof in parallel with each other. A treatment liquid is introduced between the introduction opening surface and the surface to be treated of the substrate and is sucked and recovered from between the recovery opening surface and the surface to be treated of the substrate. The flow rate of the treatment liquid flowing from the introduction opening surface to the recovery opening surface through the surface to be treated of the substrate is controlled to 0.02 to 0.3 L/min per 1 cm in the long side direction of the introduction opening surface. With this arrangement, there can be provided a wet treatment apparatus capable of using a liquid saving type nozzle under optimum conditions.
申请公布号 US2002023671(A1) 申请公布日期 2002.02.28
申请号 US20010945531 申请日期 2001.08.30
申请人 ALPS ELECTRIC CO., LTD. 发明人 MITSUMORI KENICHI;OHMI TADAHIRO
分类号 B08B3/02;B08B3/04;B08B3/12;H01L21/00;H01L21/304;(IPC1-7):B08B3/04 主分类号 B08B3/02
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