发明名称 |
METHOD OF FABRICATING A DISTRIBUTED BRAGG REFLECTOR BY CONTROLLING MATERIAL COMPOSITION USING MOLECULAR BEAM EPITAXY |
摘要 |
A distributed Bragg reflector for a vertical cavity surface emitting laser has a semiconductor material system including the elements aluminium, gallium, arsenic, and antimony. Accurate control of the composition of the semiconductor material system must be maintained to result in a distributed Bragg reflector suitable for use in a VCSEL. A method of fabricating the distributed Bragg reflector includes calibrating (20) the incorporation of at least one of the elements into the material system as different semiconductor materials are grown on a substrate (14, 22).
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申请公布号 |
WO0217363(A1) |
申请公布日期 |
2002.02.28 |
申请号 |
WO2001US41832 |
申请日期 |
2001.08.22 |
申请人 |
REGENTS OF THE UNIVERSITY OF CALIFORNIA, THE |
发明人 |
HALL, ERIC, M.;ALMUNEAU, GUILHEM |
分类号 |
H01S5/024;H01S5/042;H01S5/183;H01S5/30;H01S5/323;H01S5/343;(IPC1-7):H01L21/00;C30B23/00;H01S5/00 |
主分类号 |
H01S5/024 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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