| 摘要 |
PROBLEM TO BE SOLVED: To provide a solution processing apparatus and method which can improve its throughput by preventing such a situation as to cause an untreated substrate to be transferred to the interior of the solution processing apparatus to be returned back. SOLUTION: A solution processing apparatus 1 includes a solution processor 4 for subjecting a wafer W to solution treatment, a carrier carry-in/carry-out section 4 for carrying a carrier C having the wafer W accommodated therein in or out, a carrier stock section 6 for keeping a plurality of carriers, an interface 3 for transferring the wafer W between the carrier stock section 6 and solution processor 4, a carrier transfer device 12 for transferring the carrier, a wafer inspection device 18 for inspecting the wafer W in the carrier c, and a carrier transfer device controller 90 for controlling the carrier transfer device 12. The controller 90 keeps the carrier C judged as solution processible based on an inspection result of the wafer W in the carrier stock section 6, and controls the carrier transfer device 12 so as to start solution processing after completion of inspection of a predetermined number of carriers C. |
