发明名称 SOLID-STATE IMAGING DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To prevent falling in sensitivity of a smear characteristics and for diagonal light while the curvature of a convex lens is decreased for preventing irregularity in sensitivity. SOLUTION: After a light receiving part 2 for a pixel is formed in a surface region in a substrate 1, an inter-layer insulating film 7 comprising a dimple 7a is formed at a surface part above the light receiving part 2. A light- transmission film 8a comprising, on its surface, a recess 8b which reflects the shape of the dimple 7a is formed on the inter-layer insulating film 7. A mask layer RP whose surface is convex is formed at such position as covers the recess 8b on the light-transmission film 8a. The mask layer RP and the light- transmission film 8a are collectively etched so that the light-transmission film 8a is worked into a convex lens shape whose upper surface is curved like a convex lens.
申请公布号 JP2002064193(A) 申请公布日期 2002.02.28
申请号 JP20000251241 申请日期 2000.08.22
申请人 SONY CORP 发明人 TANIGAWA KOICHI
分类号 G02B3/00;H01L27/14;H01L27/146;H04N5/335;H04N5/341;H04N5/359;H04N5/369;H04N5/372;(IPC1-7):H01L27/14 主分类号 G02B3/00
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