发明名称 METHOD OF FABRICATING A DISTRIBUTED BRAGG REFLECTOR BY CONTROLLING MATERIAL COMPOSITION USING MOLECULAR BEAM EPITAXY
摘要 <p>A distributed Bragg reflector for a vertical cavity surface emitting laser has a semiconductor material system including the elements aluminium, gallium, arsenic, and antimony. Accurate control of the composition of the semiconductor material system must be maintained to result in a distributed Bragg reflector suitable for use in a VCSEL. A method of fabricating the distributed Bragg reflector includes calibrating (20) the incorporation of at least one of the elements into the material system as different semiconductor materials are grown on a substrate (14, 22).</p>
申请公布号 WO2002017363(A1) 申请公布日期 2002.02.28
申请号 US2001041832 申请日期 2001.08.22
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