发明名称 Dielectric layer liner for an integrated circuit structure
摘要 An integrated circuit structure (8) includes a plurality of solid state electronic devices and a plurality of conductive elements (12, 14) that electrically couple the electronic devices. The integrated circuit structure (8) also includes a dielectric layer (16) positioned between two or more of the conductive elements (12, 14). A liner (18) is positioned between at least a portion of the dielectric layer (16) and a conductive element (12, 14). The liner (18) is formed from a compound that includes silicon and either carbon and nitrogen.
申请公布号 US2002024117(A1) 申请公布日期 2002.02.28
申请号 US20010938260 申请日期 2001.08.23
申请人 RUSSELL STEVEN W.;LEE WEI WILLIAM 发明人 RUSSELL STEVEN W.;LEE WEI WILLIAM
分类号 H01L23/522;H01L23/532;(IPC1-7):H01L23/58 主分类号 H01L23/522
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