发明名称 |
Dielectric layer liner for an integrated circuit structure |
摘要 |
An integrated circuit structure (8) includes a plurality of solid state electronic devices and a plurality of conductive elements (12, 14) that electrically couple the electronic devices. The integrated circuit structure (8) also includes a dielectric layer (16) positioned between two or more of the conductive elements (12, 14). A liner (18) is positioned between at least a portion of the dielectric layer (16) and a conductive element (12, 14). The liner (18) is formed from a compound that includes silicon and either carbon and nitrogen.
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申请公布号 |
US2002024117(A1) |
申请公布日期 |
2002.02.28 |
申请号 |
US20010938260 |
申请日期 |
2001.08.23 |
申请人 |
RUSSELL STEVEN W.;LEE WEI WILLIAM |
发明人 |
RUSSELL STEVEN W.;LEE WEI WILLIAM |
分类号 |
H01L23/522;H01L23/532;(IPC1-7):H01L23/58 |
主分类号 |
H01L23/522 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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