METHOD AND DEVICE FOR CONTINUOUS COLD PLASMA DEPOSITION OF METAL COATINGS

摘要

The invention concerns a method and a device for depositing a metal coating on a substrate (1) which consists in a cold plasma deposition inside a heated confinement chamber (7) so as to avoid the formation of a metal deposit at its surface, said chamber (7) having an inlet orifice (21) and an outlet orifice (22) through which the substrate to be coated enters and leaves said chamber, a metal vapour source, forming an electrode, being provided in said chamber enabling the formation of plasma (6) therein, a counter-electrode being formed by the substrate (1) or by a separate electrically conducting element. The invention is characterised in that it consists in introducing the metal, with which a metal coating is to be formed on the substrate (1), in molten state in a retention tank (8) communicating with the confinement chamber (7) and in maintaining the molten metal in said tank (8) at a substantially constant level while the metal coating is being formed.