| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin laminate capable of forming a fine pattern in a good yield in a substrate to be worked, e.g. a glass, low melting point glass or ceramic substrate as a mask material for sandblast excellent in sensitivity, resolution and adhesion particularly when it is applied to a plasma display panel and capable of easily peeling a base from a photosensitive resin layer when a base peeling device is used and to provide a surface working method using the laminate. SOLUTION: A photosensitive resin layer comprising a photosensitive resin composition containing a polyurethane prepolymer, an alkali-soluble polymer, an ethylenically unsaturated addition polymerizable monomer and a photopolymerization initiator and, optionally, a protective layer are successively stacked on a base comprising a substrate film with a peeling agent formed on the surface and surface working is carried out using the resulting laminate. |
