发明名称 QUARTZ BELL JAR FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a quartz bell jar of high reliability for semiconductor manufacturing equipment which can detect working limit easily without measuring thickness periodically. SOLUTION: The thickness of a quartz bell jar 10 is reduced gradually from an inner wall by etching gas which is introduced to the inside. A recess region RCS formed in a part of the surface of an outer wall of the bell jar 10 has a thickness T1 regulating the working limit of the bell jar 10. A protruding type quartz segment 11 is buried in the recess region RCS and fixed. At least a surface of the quartz segment 11 which is bonded to the recess region RCS surface is a blast surface BLS subjected to blast treatment so as to form a roughened surface (dulling). The whole of the bell jar has a thickness greater than the thickness including the fixed quartz segment 11 and regulating the working limit.
申请公布号 JP2002064081(A) 申请公布日期 2002.02.28
申请号 JP20000248522 申请日期 2000.08.18
申请人 SEIKO EPSON CORP 发明人 OKUBO ATSUSHI
分类号 H01L21/302;H01L21/3065;(IPC1-7):H01L21/306 主分类号 H01L21/302
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