| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a reticle capable of relatively easily judging the presence of errors in magnification and rotation by a relatively small frequency of measurement without making a complex calculation and to provide a method for producing a semiconductor device using the reticle. SOLUTION: The reticle has superposition marks for measuring errors in magnification and rotation caused by a shot of exposure and has a chip pattern region 11, a scribed pattern region I2 formed in such a way that it encloses the region 11, and the superposition marks formed on the four corners of the region 12. The marks comprise an outside X part 15 disposed on the upper left corner of the region 12, an inside X part 16 disposed on the upper right corner of the region 12, an outside Y part 17 disposed on the lower left corner of the region 12 and an inside Y part 18 disposed on the lower right corner of the region 12.</p> |
