发明名称 |
Electron-beam drawing appraratus electron-beam drawing method |
摘要 |
In the case of drawing an oblique figure pattern, when drawing an oblique figure by using a slender rectangular beam, a problem occurs that edge roughness occurs at an oblique-side portion to deteriorate the drawing accuracy. The present invention solves the above problem and provides an electron-beam drawing apparatus and an electron-beam drawing method capable of accurately drawing even an oblique figure. A first rectangular aperture and a second parallelogrammatic aperture are used and a variable parallelogrammatic electron beam formed by two apertures is used to draw a desired pattern on the surface of a sample. Moreover, oblique-side-portion-contour decomposition means is used to draw an oblique-side portion by a variable parallelogram and the inside of an oblique side by a triangle and a quadrangle (rectangle).
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申请公布号 |
US2002024020(A1) |
申请公布日期 |
2002.02.28 |
申请号 |
US20010935185 |
申请日期 |
2001.08.22 |
申请人 |
ANDO KIMIAKI;YODA HARUO;TOMIYOSHI RIKIO;KAWANO MASAMICHI |
发明人 |
ANDO KIMIAKI;YODA HARUO;TOMIYOSHI RIKIO;KAWANO MASAMICHI |
分类号 |
G03F7/20;H01J37/09;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):G21G5/00;A61N5/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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