| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material having low fog and high Dmax (maximum density), less liable to the rise of fog in storage and having low temperature and humidity dependencies in development as a heat developable photosensitive material particularly for a photomechanical process and particularly for a scanner or an image setter. SOLUTION: In the heat developable photosensitive material with an image forming layer containing at least a non-photosensitive silver salt, photosensitive silver halide, a nucleus forming agent and a binder on the base and a protective layer on the side of the image forming layer opposite to the base, at least one organic acid compound of formula (A) (where L1 and L2 are each a linking group and n1 and n2 are each an integer of 0-30) is contained on the side with the image forming layer and the pH of the film surface does not substantially vary after coating.
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