发明名称 Field effect transistor
摘要 A field effect transistor with a high withstand voltage and a low resistance is provided. A ring-shaped channel region is disposed inside a source region formed in a ring, and the inside of the channel region is taken as a drain region. A depletion layer extends toward the inside of the drain region, resulting in a high withstand voltage. In the portion, except the portion within a prescribed distance from the corner portion of the channel region, a low resistance conductive layer is disposed, thereby resulting in high withstand voltage.
申请公布号 US2002024056(A1) 申请公布日期 2002.02.28
申请号 US20010908540 申请日期 2001.07.20
申请人 SHINDENGEN ELECTRIC MANUFACTURING CO., LTD. 发明人 MIYAKOSHI NOBUKI;MATSUBARA TOSHIKI;NAKAMURA HIDEYUKI
分类号 H01L21/336;H01L29/06;H01L29/08;H01L29/10;H01L29/423;H01L29/739;H01L29/78;(IPC1-7):H01L29/76;H01L29/74 主分类号 H01L21/336
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