发明名称 Semiconductor integrated circuit and fabrication method thereof
摘要 A semiconductor integared circuit having a high withstand voltage TFT and a TFT which is capable of operating at high speed in a circuit of thin film transistors (TFT) and methods for fabriacting such circuits will be provided. A gate insulating film of the TFT required to operate a high speed (e.g., TFT used for a logic circuit) is relatively thinned less than a gate insulating film of the TFT which is required to have high withstand voltage (e.g., TFT used for switching high voltage signals).
申请公布号 US2002024048(A1) 申请公布日期 2002.02.28
申请号 US20010967697 申请日期 2001.09.28
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 OHTANI HISASHI
分类号 H01L21/77;H01L21/84;H01L27/12;H01L29/423;H01L29/49;(IPC1-7):H01L29/76;H01L31/036;H01L31/112 主分类号 H01L21/77
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