发明名称 COMPOUND SEMICONDUCTOR AND METHOD OF MANUFACTURING THE SAME, AND COMPOUND SEMICONDUCTOR LIGHT-EMITTING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a compound semiconductor, having proper crystallinity and low resistivity, which could not be achieved by a GaN-based compound semiconductor, and to provide a method of manufacturing the same, and also provide a semiconductor light-emitting device using this compound semiconductor which has superior electrical and optical characteristics. SOLUTION: In this compound semiconductor, Ga1-xAlxN layer (0<=x<=1) is added with In and is doped with donors. By applying compressive strain to the crystal of such a compound semiconductor, an expansion strain in the crystal caused by nitrogen holes can be reduced, thus obtaining a good N type compound semiconductor which has fewer lattice defects and a superior crystallinity.
申请公布号 JP2002064249(A) 申请公布日期 2002.02.28
申请号 JP20010190817 申请日期 2001.06.25
申请人 SHARP CORP 发明人 HOSOBANE HIROYUKI;SUYAMA NAOHIRO;YOSHIDA TOMOHIKO;KANEIWA SHINJI;KONDO MASAFUMI;HATA TOSHIO;OBAYASHI TAKESHI
分类号 H01L21/205;H01L33/32;H01S5/323 主分类号 H01L21/205
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