发明名称 METHOD FOR FORMING ALIGNMENT LAYER
摘要 PROBLEM TO BE SOLVED: To provide a method for forming an alignment layer on a substrate. SOLUTION: The film is adhered and aligned in a single step with a method containing a step to shoot an ion-beam at the substrate with a specified incident angle and simultaneously to adhere the film to the substrate (a) and to align an atomic structure of the film in at least a specified aligning direction (b).
申请公布号 JP2002062532(A) 申请公布日期 2002.02.28
申请号 JP20010192436 申请日期 2001.06.26
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 CALLEGARI ALESSANDRO;PURAVIIN CHOODARI;JAMES PATRICK DOYLE;GALLIGAN EILEEN ANN;KATO YOSHIMINE;JAMES ANDREW LACEY;SHUI CHIN ALAN RYAN;MINHA RUU;NAKANO HIROTAKE
分类号 G02F1/1333;C23C14/06;C23C14/22;C23C14/34;G02F1/1337;(IPC1-7):G02F1/133 主分类号 G02F1/1333
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