发明名称 |
METHOD FOR FORMING ALIGNMENT LAYER |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming an alignment layer on a substrate. SOLUTION: The film is adhered and aligned in a single step with a method containing a step to shoot an ion-beam at the substrate with a specified incident angle and simultaneously to adhere the film to the substrate (a) and to align an atomic structure of the film in at least a specified aligning direction (b). |
申请公布号 |
JP2002062532(A) |
申请公布日期 |
2002.02.28 |
申请号 |
JP20010192436 |
申请日期 |
2001.06.26 |
申请人 |
INTERNATL BUSINESS MACH CORP <IBM> |
发明人 |
CALLEGARI ALESSANDRO;PURAVIIN CHOODARI;JAMES PATRICK DOYLE;GALLIGAN EILEEN ANN;KATO YOSHIMINE;JAMES ANDREW LACEY;SHUI CHIN ALAN RYAN;MINHA RUU;NAKANO HIROTAKE |
分类号 |
G02F1/1333;C23C14/06;C23C14/22;C23C14/34;G02F1/1337;(IPC1-7):G02F1/133 |
主分类号 |
G02F1/1333 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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