发明名称 COATING TREATMENT METHOD AND DIAPHRAGM PLATE
摘要 PROBLEM TO BE SOLVED: To provide a coating treatment method by which coating with a dense high-purity conductive amorphous thin film having excellent reproducibility can be applied to the inside of minute holes and also to provide a diaphragm plate. SOLUTION: When osmium coating is applied to a metal sheet 16, e.g. a metal sheet having minute holes, such as a diaphragm plate of an electron microscope, gaseous hydrogen is added to sublimed gas composed of osmium oxide in the plasma-enhanced chemical vapor deposition method. The conductive amorphous thin film having dense structure can be deposited uniformly over the surface of the diaphragm and the inside of the minute holes. Further, the high-purity osmium film having low concentration of impurities, such as oxygen, can be deposited, and also reproducibility can be improved.
申请公布号 JP2002060941(A) 申请公布日期 2002.02.28
申请号 JP20000243770 申请日期 2000.08.11
申请人 DAIWA TECHNO SYSTEMS:KK 发明人 SATO HIROSHI
分类号 C23C16/06;C23C16/503;H01J9/14;H01J37/09;(IPC1-7):C23C16/06 主分类号 C23C16/06
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