发明名称 |
Liquid sprays as the target for a laser-plasma extreme ultraviolet light source |
摘要 |
<p>A laser-plasma EUV radiation source (50) that generates larger liquid droplets (72) for the plasma target material. The EUV source (50) forces a liquid (58), preferably Xenon, through a nozzle (64), instead of forcing a gas through the nozzle. The geometry of the nozzle (64) and the pressure of the liquid (58) through the nozzle (64) atomizes the liquid (58) to form a dense spray (70) of droplets (72). Because the droplets (72) are formed from a liquid, they are larger in size, and are more conducive to generating EUV radiation. A condenser (60) is used to convert gaseous Xenon (54) to the liquid (58) prior to being forced through the nozzle (64).</p> |
申请公布号 |
EP1182912(A1) |
申请公布日期 |
2002.02.27 |
申请号 |
EP20010117689 |
申请日期 |
2001.07.26 |
申请人 |
TRW INC. |
发明人 |
MCGREGOR, ROY D.;PETACH, MICHAEL B.;ORSINI, ROCCO A. |
分类号 |
G21K5/00;G03F7/20;G21K5/08;H01L21/027;H05G2/00;H05H1/24;(IPC1-7):H05G2/00 |
主分类号 |
G21K5/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|