发明名称 Liquid sprays as the target for a laser-plasma extreme ultraviolet light source
摘要 <p>A laser-plasma EUV radiation source (50) that generates larger liquid droplets (72) for the plasma target material. The EUV source (50) forces a liquid (58), preferably Xenon, through a nozzle (64), instead of forcing a gas through the nozzle. The geometry of the nozzle (64) and the pressure of the liquid (58) through the nozzle (64) atomizes the liquid (58) to form a dense spray (70) of droplets (72). Because the droplets (72) are formed from a liquid, they are larger in size, and are more conducive to generating EUV radiation. A condenser (60) is used to convert gaseous Xenon (54) to the liquid (58) prior to being forced through the nozzle (64).</p>
申请公布号 EP1182912(A1) 申请公布日期 2002.02.27
申请号 EP20010117689 申请日期 2001.07.26
申请人 TRW INC. 发明人 MCGREGOR, ROY D.;PETACH, MICHAEL B.;ORSINI, ROCCO A.
分类号 G21K5/00;G03F7/20;G21K5/08;H01L21/027;H05G2/00;H05H1/24;(IPC1-7):H05G2/00 主分类号 G21K5/00
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