发明名称 GATE VALVE FOR SEMICONDUCTOR PROCESSING SYSTEM
摘要 <p>A gate valve (20) for a semiconductor processing system includes a base frame (28) configured movable along a guide (26) to move toward and away from a valve seat (22), which surrounds an opening portion (14). A first stopper (56) is disposed at the upper end of the guide (26), for defining the movement limit of the base frame (28) on the valve seat (22) side. A swing frame (34) is rotatably attached to the base frame (28), and has an upper end connected to a valve plug (24). The swing frame (34) is connected to the base frame (28) by a link mechanism (36), which can bend and stretch while flexing an intermediate portion, and by a spring and damper member (44). The intermediate portion of the link mechanism (36) has a mediation member (38) connected to a reciprocation rod (54) of an air actuator (52). &lt;IMAGE&gt; &lt;IMAGE&gt; &lt;IMAGE&gt;</p>
申请公布号 EP1182387(A1) 申请公布日期 2002.02.27
申请号 EP20000929917 申请日期 2000.05.30
申请人 TOKYO ELECTRON LIMITED 发明人 OKA, HIROKI
分类号 F16K51/02;F16K3/18;(IPC1-7):F16K3/18 主分类号 F16K51/02
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