EXPOSURE DEVICE AND METHOD, AND METHOD FOR MANUFACTURING EXPOSURE DEVICE AND MICRODEVICE

摘要

PURPOSE: A device and method for exposing, and a manufacturing method for an exposure device and a microdevice are provided to expose optimally by compensating optical property with preventing lowering in radiating heat from a projection optical module. CONSTITUTION: A memory unit stores the correlation of the positional change in the image planes of projection optical modules in the focusing direction and the light quantity change. An image plane position determination unit detects the positional change value of the image planes of the projection optical modules based on information on correlation stored in the memory unit and changes of light emitting to the projection optical module. A compensation value calculating unit operates the compensation value corresponding to the change in the amount of curvature in the image plane of the projection optical module. A compensating unit compensates the change value in conformity with the compensation value. A focus compensation optical system is driven based on the compensated change value.