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发明名称
Plasma uniformity control for an inductive plasma reactor
摘要
申请公布号
EP0820086(B1)
申请公布日期
2002.02.27
申请号
EP19970305062
申请日期
1997.07.09
申请人
APPLIED MATERIALS, INC.
发明人
HANAWA, HIROJI;LOEWENHARDT, PETER K.;DRISCOLL, TIMOTHY D.;YIN, GERALD ZHEYAO
分类号
H05H1/46;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H01J37/32
主分类号
H05H1/46
代理机构
代理人
主权项
地址
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