PHASE SHIFT MASK BLANK, PHASE SHIFT MASK AND METHOD FOR PRODUCING THE SAME

摘要

PURPOSE: To provide a phase shift mask blank obtained by disposing at least one phase shift membrane consisting essentially of a metal and silicon and having <= 100 MPa membrane stress on a transparent substrate and to provide a phase shift mask obtained by pattering the blank and a method for producing these. CONSTITUTION: The membrane stress of a phase shift membrane can be reduced to <= 100 MPa by using a metal and silicon as the principal components of the membrane, particularly by forming the membrane from molybdenum silicide oxycarbide or molybdenum silicide oxycarbonitride. When the phase shift membrane is formed on a substrate, the flatness of the substrate is not degraded and the objective high quality phase shift mask blank having good flatness even after the patterning of the phase shift membrane and the objective phase shift mask are obtained.