发明名称 EXHAUST GAS TREATING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide an exhaust gas treating device capable of sufficiently reducing the particulate concentration in exhaust gas by preventing releasing of a medium to the outside of fluid layers while suppressing a pressure loss due to clogging at the exhaust gas exist of the fluid layers where the medium such as carbonaceous adsorbent, etc., flows. SOLUTION: The exhaust gas treating device 100 is obtained by forming the fluid layers S1 to S3 for the carbonaceous adsorbent Pf to flow down between the exhaust gas feeding part 18 and an exhaust gas exhausting part 20. The layer S3 and the part 20 are partitioned by an exist porous plate 4 which is flat, has plural circular holes 4a and meets relation expressed by a formula (1) under this; 0.2<=Dp/Da<=0.55...(1) In this formula, Dp shows the minimum diameter of a circular hole 4a and Da shows the average diameter of the carbonaceous adsorbent.</p>
申请公布号 JP2002058953(A) 申请公布日期 2002.02.26
申请号 JP20000252796 申请日期 2000.08.23
申请人 SUMITOMO HEAVY IND LTD 发明人 WATABE TERUO
分类号 B01D53/34;B01D53/50;B01D53/56;B01D53/70;B01D53/81;B01J8/12;(IPC1-7):B01D53/34 主分类号 B01D53/34
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