发明名称 |
HARMFUL GAS VENTILATING AND ABSORBING APPARATUS |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a poisonous gas ventilating and absorbing apparatus which can be minimized in an installing space and can reduce the noise of the processing. SOLUTION: The exhausting path of poisonous gas leaked from the poisonous gas using an apparatus 2 is formed in the wall of an enclosure 5 and an atomizing means 22 of a fluid absorbing the poisonous gas is installed in the exhausting path.</p> |
申请公布号 |
JP2002058950(A) |
申请公布日期 |
2002.02.26 |
申请号 |
JP20000251397 |
申请日期 |
2000.08.22 |
申请人 |
HITACHI PLANT ENG & CONSTR CO LTD |
发明人 |
MEGURO AKIRA |
分类号 |
F24F7/007;B01D53/14;B01D53/18;F24F7/06;(IPC1-7):B01D53/18 |
主分类号 |
F24F7/007 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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