发明名称 HARMFUL GAS VENTILATING AND ABSORBING APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide a poisonous gas ventilating and absorbing apparatus which can be minimized in an installing space and can reduce the noise of the processing. SOLUTION: The exhausting path of poisonous gas leaked from the poisonous gas using an apparatus 2 is formed in the wall of an enclosure 5 and an atomizing means 22 of a fluid absorbing the poisonous gas is installed in the exhausting path.</p>
申请公布号 JP2002058950(A) 申请公布日期 2002.02.26
申请号 JP20000251397 申请日期 2000.08.22
申请人 HITACHI PLANT ENG & CONSTR CO LTD 发明人 MEGURO AKIRA
分类号 F24F7/007;B01D53/14;B01D53/18;F24F7/06;(IPC1-7):B01D53/18 主分类号 F24F7/007
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