发明名称 Real time control device for electroformation, plating and deplating processes
摘要 Precise control of deposition or etching of thin films on a transparent substrate is particularly useful for electroformation of nozzles and formation control. A computer based measuring system is used to measure, in real time, a test feature such as one such nozzle. The rate of material deposition and removal is controlled based on the measured value of the test feature. In particular, a video camera and microscope are used to produce images of the test feature. During the electroplating process, metal is plated onto a conductive layer, and as the plated metal layer grows up from the conductive layer of the mandrel, the plated layer can also encroach on transparent openings produced by the absence of the mandrel conductive layer. The amount of encroachment on the transparent openings is directly related to the thickness of the plated layer.
申请公布号 US6350361(B1) 申请公布日期 2002.02.26
申请号 US19990251606 申请日期 1999.02.17
申请人 SCITEX DIGITAL PRINTING, INC. 发明人 SEXTON RICHARD W.;HARRISON, JR. JAMES E.;FAGERQUIST RANDY L.
分类号 C25D1/08;C25D21/12;(IPC1-7):C25D1/08 主分类号 C25D1/08
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