发明名称 CLEANING SHEET AND METHOD FOR CLEANING SUBSTRATE TREATMENT APPARATUS USING THE SHEET
摘要 PROBLEM TO BE SOLVED: To provide a cleaning sheet for a substrate treatment apparatus to be shielded from the contamination such as a production apparatus and an inspection device such as a semiconductor, a flat panel display and a printed board, and a method for cleaning the apparatus. SOLUTION: A cleaning sheet in which the Vickers hardness of its cleaning layer is at least 10, a cleaning sheet in which the surface free energy of its cleaning layer is at least 20 mJ/m2, a cleaning sheet in which an adhesive layer is formed on one side of its cleaning layer, a cleaning sheet in which a cleaning layer at least 10 in Vickers hardness is formed at least on one side of its support, and a cleaning sheet in which an adhesive layer is formed on the other side are provided.
申请公布号 JP2002059098(A) 申请公布日期 2002.02.26
申请号 JP20000243752 申请日期 2000.08.11
申请人 NITTO DENKO CORP 发明人 NAMIKAWA AKIRA;TERADA YOSHIO
分类号 B08B6/00;B08B1/00;H01L21/304;(IPC1-7):B08B6/00 主分类号 B08B6/00
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