发明名称 DIAMOND-POLISHING MATERIAL PARTICLE AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide finely single crystal type polishing material particles which are produced from diamond synthesized under an ordinary static very-high pressure using a press as a raw material and can simultaneously satisfy a large processing quantity per unit time and small processed surface roughness, and to provide a method for producing the particles. SOLUTION: The diamond polishing material particles comprising the non- coagulated aggregates of fine single crystal diamond particles which exhibit a D50 value average particle diameter of 5 to 40 μm and whose crystal structures and/or collective physical properties are remarkably affected by thermal treatments, wherein the surfaces of the diamond particles are covered with non-diamond carbon in an amount of >=0.5% based on the total weight of the diamond particles. The method for producing the diamond polishing material particles, characterized by thermally treating the diamond particles exhibiting the above-mentioned D50 value average particle diameter at a thermal treatment temperature of >=600 deg.C in a non-oxidizing environment to partially convert the surfaces of the diamond particles into a non-diamond carbon.
申请公布号 JP2002060733(A) 申请公布日期 2002.02.26
申请号 JP20000247861 申请日期 2000.08.17
申请人 ISHIZUKA KENKYUSHO:KK 发明人 YAMANAKA HIROSHI;OSHIMA RYUJI;ISHIZUKA HIROSHI
分类号 B01J3/06;C01B31/06;C09K3/14 主分类号 B01J3/06
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