发明名称 PROCESS FOR PRODUCING ENYNE DERIVATIVES
摘要 A process for producing an enyne derivative of the formula: wherein R1 is a hydrogen atom, a lower alkyl group, a halo lower alkyl group, a lower alkenyl group, a lower alkynyl group or a cycloalkyl group, R2 is a hydrogen atom or a group of the formula: <IMGS> wherein each of R3, R31 and R32 which may be the same or different, is a hydrogen atom or a lower alkyl group, each of R4, R5, R41 and R51 which may be the same or different, is a hydrogen atom, a halogen atom, a hydroxyl group, a lower alkyl group or a lower alkoxy group, R42 is a hydroxyl group, a halogen atom, a group of the formula B-O- (wherein B is a protecting group for a hydroxyl group), a hydroxymethyl group, a formyl group, a carboxyl group, a lower alkoxycarbonyl group, a lower alkanoyl group, an amino group, a mercapto group or a group of the formula R6-X-Y- (wherein R6 is a phenyl or thienyl group which may have one or two substituents selected from the group consisting of a halogen atom, a hydroxyl group, a lower alkyl group, a cyano group, a lower alkoxy group and a heterocyclic group, each of X and Y which may be the same or different, is an oxygen atom, a sulfur atom, a carbonyl group, a group of the formula -CHR a- (wherein R a is a hydrogen atom or a lower alkyl group) or a group of the formula -NR b- (wherein R b is a hydrogen atom or a lower alkyl group), or X and Y together form a vinylene group or an ethynylene group), provided that when either one of X and Y is an oxygen atom, a sulfur atom or a group of the formula -NR b- (wherein R b is as defined above), the other is a carbonyl group or a group of the formula -CHR a- (wherein R a is as defined above), and R 7 is a lower alkyl or cycloalkyl group which may have a hydroxyl group or a lower alkoxy group, a phenyl group or a tri-lower alkylsilyl group, which process comprises reacting a compound of the formula: Z-CH2-CH=CH-W [I] wherein W is a halogen atom, and Z is a leaving group, with an amine of the formula: wherein R11 is a hydrogen atom, a lower alkyl group, a halo lower alkyl group, a lower alkenyl group, a lower alkynyl group or a cycloalkyl group, and R21 is a hydrogen atom or a group of the formula: <IMGS> wherein R3, R4, R5, R31, R32, R41, R42 and R51 are as defined above, if necessary in the presence of a base, to obtain a compound of he formula: wherein R11, R21 and W are as defined above, then reacting to this compound an acetylene derivative of the formula: HC.ident.C-R7 [V] wherein R7 is as defined above, in the presence of a palladium catalyst, to obtain a compound of the formula: wherein R11, R21 and R7 are asdefined above, and, if necessary, N-alkylating this compound.
申请公布号 CA2026599(C) 申请公布日期 2002.02.26
申请号 CA19902026599 申请日期 1990.10.01
申请人 BANYU PHARMACEUTICAL CO., LTD. 发明人 NAKAGAWA, SUSUMU;ASAI, AKIRA;KUROYANAGI, SATORU;ISHIHARA, MAKOTO;TANAKA, YOSHIHARU
分类号 C07D333/16;B01J31/24;C07B37/04;C07B61/00;C07C209/08;C07C209/16;C07C209/22;C07C209/68;C07C211/23;C07C211/24;C07C211/27;C07C211/29;C07C211/30;C07C211/35;C07C213/08;C07C215/24;C07C215/42;C07C215/48;C07C215/50;C07C217/46;C07C217/52;C07C217/56;C07C217/58;C07D333/04;C07D333/20;C07D333/28;C07D333/54;C07D333/58;C07D333/62;(IPC1-7):C07C209/68;C07D333/00;C07F7/10 主分类号 C07D333/16
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