发明名称 |
Optical critical dimension metrology system integrated into semiconductor wafer process tool |
摘要 |
A wafer measurement station integrated within a process tool has a scatterometry instrument for measuring patterned features on wafers. A wafer handler feeds wafers between a cassette and one or more process stations of the process tool. Wafers presented to the measurement station are held on a wafer support, which may be moveable, and a scatterometry instrument has an optical measurement system that is moveable by a stage over the wafer support. A window isolates the moveable optics from the wafer. The optical measurement system are microscope-based optics forming a low NA system. The illumination spot size at the wafer is larger than a periodicity of the patterned features, and data processing uses a scattering model to analyze the optical signature of the collected light. |
申请公布号 |
AU8124301(A) |
申请公布日期 |
2002.02.25 |
申请号 |
AU20010081243 |
申请日期 |
2001.08.10 |
申请人 |
SENSYS INSTRUMENTS CORPORATION |
发明人 |
MICHAEL WEBER-GRABAU;EDRIC H. TONG;ADAM E. NORTON;FRED E. STANKE;JAMES M. CAHILL JR.;DOUGLAS E. RUTH;KENNETH C. JOHNSON |
分类号 |
H01L21/66;G01N21/956;G03F7/20;H01L21/02;H01L21/027 |
主分类号 |
H01L21/66 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|