Silicon-on-insulator optical waveguide fabrication by local oxidation of silicon

摘要

A method of fabricating an optical waveguide using a silicon-on-insulator wafer having a first layer of silicon dioxide positioned between a silicon substrate and a second layer of silicon. The method includes the steps of depositing a masking layer on at least a portion of the second layer of silicon, oxidizing unmasked portions of the second layer, and removing the oxidized unmasked portions of the second layer to define a channel waveguide in which optical radiation can propagate.