| 摘要 |
PURPOSE: A method for forming a color filter of an image sensor and a micro lens is provided to reduce manufacturing cost by omitting a process for forming an over coating layer(OCL) after a color filter array is formed, and to improve photo sensitivity of the image sensor by increasing photo energy transmissivity. CONSTITUTION: A passivation layer(22) is formed on a semiconductor substrate(20) having a lower structure(21) to planarize the semiconductor substrate. The first color photoresist pattern, the second color photoresist pattern and the third color photoresist pattern are formed on the passivation layer at regular intervals, functioning as the color filter. The micro lenses(23) respectively coupled to the first color photoresist pattern, the second color photoresist pattern and the third color photoresist pattern are formed.
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