发明名称 |
Method of producing semiconductor integrated circuit device and method of producing multi-chip module |
摘要 |
Productivity of a semiconductor integrated circuit device is improved. According to how many times the photomask is used, a photomask having an opaque pattern made of metal and a photomask having an opaque pattern made of a resist film are properly used, and thereby an exposure treatment is performed. <IMAGE> |
申请公布号 |
AU7873601(A) |
申请公布日期 |
2002.02.25 |
申请号 |
AU20010078736 |
申请日期 |
2001.08.15 |
申请人 |
HITACHI LTD. |
发明人 |
TSUNEO TERASAWA;TOSHIHIKO TANAKA;KO MIYAZAKI;NORIO HASEGAWA;KAZUTAKA MORI |
分类号 |
G03F1/54;G03F1/56;G03F7/20;H01L21/768 |
主分类号 |
G03F1/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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