发明名称 SEMICONDUCTOR WAFER-BAKING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a wafer-baking device that prevents heat radiation in a wafer edge for uniformly maintaining the temperature of a wafer. SOLUTION: This semiconductor wafer-baking device is composed of a heating plate where the wafer is mounted, a wafer guide part that guides the wafer so that the wafer is properly aligned on the heating plate, and a release heat compensation part that is positioned at an upper part in the wafer guide part for compensating for heat released from the edge of the wafer. A heating device (heat wire) is incorporated into the release heat compensation part, and the heating plate and release heat compensation part can simultaneously or independently apply electric power.
申请公布号 JP2002057079(A) 申请公布日期 2002.02.22
申请号 JP20010174607 申请日期 2001.06.08
申请人 UNISEM CO LTD 发明人 BYUNG-IL LEE;RI DAIU
分类号 H01L21/027;H01L21/00;(IPC1-7):H01L21/027 主分类号 H01L21/027
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