| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for etching which is suitable for fine processing of a magnetic multilayer thin film which is formed by laminating plural layers mainly of magnetic alloys, such as a TMR film required for producing MRAMs or high-density magnetic heads and especially which can be performed in a temperature range where the characteristics of the magnetic multilayer thin film can be maintained with no reattach. SOLUTION: The method for etching the magnetic multilayer thin film including thin films of magnetic metal materials is composed of a step of changing a film of magnetic metal material into a metal compound, a step of forming a complex by complexing the thin film of metal compound, and a step of sublimation for sublimating the complex. In this case, the etching is performed in such a way that the step of change of the thin film in magnetic metal is a rate-determining process.
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