| 摘要 |
PROBLEM TO BE SOLVED: To provide a dry cleaning method of a treatment device which enables accurate final point detection. SOLUTION: A sensor for measuring and monitoring chamber pressure, and substance concentration or thickness of a deposit film during cleaning is provided inside a device 11 and a final point is detected based on data from a sensor. Alternately, plasma is partially generated inside the chamber 11 and a final point is detected by monitoring light emission intensity of the plasma. Alternately, light is directed into a chamber and light which has passed through a chamber is measured and monitored, thus detecting a final point.
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