发明名称 ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To provide an illumination optical apparatus, aligner and method therefor which can provide irregular illumination such as annular illumination or 4-pole illumination having a uniform illuminance distribution, while properly suppressing the loss of light quantity in an aperture stop. SOLUTION: The illumination optical apparatus includes a first fly-eye lens 4 as a sort of optical integrator forming a multiple light source of many light sources based on light fluxes from the light sources, and a condenser lens for guiding light flux from the first fly-eye lens 4 onto a surface to be illuminated. The apparatus further includes a diffraction optical element 1 as a light flux converting means for forming a plurality of planar light sources biased from an annular surface light source or a reference optical axis on a pupil surface PL4 of the apparatus and on an incident surface PL3 as a conjugate surface of a surface to be illuminated. At least, any one of the first fly-eye lens 4 and diffraction optical element 1 compensates for an irregularity in the illuminance distribution of at least any one of the planar light sources formed on the pupil surface PL4 or diffraction optical element 1.
申请公布号 JP2002057081(A) 申请公布日期 2002.02.22
申请号 JP20000239151 申请日期 2000.08.07
申请人 NIKON CORP 发明人 GOTO AKIHIRO;TANITSU OSAMU
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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