| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma CVD film-forming device having a cleaning function that can efficiently remove invalid films and particles adhering onto the wall surface of device components, and the self-cleaning method of the plasma CVD film-forming device. SOLUTION: This plasma CVD film-forming device has the cleaning function for removing foreign objects adhering onto the wall surface, and at the same time includes an etching gas supply means 14 for supplying an etching gas into a film-forming chamber, cleaning electrodes 13, 23 and 29 for locally generating discharge plasma near the wall surface under the presence of the etching gas, and exhaust means 11 and 20 for discharging the inside of the film-forming chamber while discharge plasma is being generated by the cleaning electrodes.
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