METHOD AND APPARATUS FOR TUNING A PLASMA REACTOR CHAMBER

摘要

A plasma reactor (10) or vacuum processing apparatus is provided with an orifice plate assembly (40). The orifice plate assembly (40) includes an upper plate (42) and a lower plate (44). Each plate is configured with through holes (46A-46N, 48A-48N). The upper and lower orifice plates (42, 22) are independently rotatable with respect to each other. The plates are arranged within the vacuum chamber (12) a discharge reactor (10) such that the chuck assembly (14) is disposed within an opening in the orifice plate assembly (40). The orifice plate assembly is further configured to have a perimeter shape that substantially matches the interior wall shape of vacuum chamber (12).