发明名称 Substrate conveying system in exposure apparatus
摘要 Disclosed is a substrate conveying system for conveying a substrate to and from an accommodating container, wherein a fork-like hand arranged to hold a reticle by attraction is relatively moved close to or away from and upwardly or downwardly, relative to the container. The container has a supporting member for supporting one or more reticles and a positioning member for positioning the same in a horizontal plane. The conveying system has an obstacle detector, comprising a transmission type sensor, for detecting presence/absence of any obstacle in a region through which the hand is inserted to transfer a reticle. This structure avoids interference between the hand and the container or the reticle.
申请公布号 US2002021435(A1) 申请公布日期 2002.02.21
申请号 US20010887034 申请日期 2001.06.25
申请人 YAMADA KOHEI 发明人 YAMADA KOHEI
分类号 B25J19/04;B25J19/06;B65G49/06;B65G49/07;G03F7/20;H01L21/027;H01L21/677;H01L21/68;(IPC1-7):G03B27/42;G03B27/58 主分类号 B25J19/04
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