| 摘要 |
This invention presents a substrate processing apparatus comprising a substrate holder holding a substrate with a holding angle of 45 degree to 90 degree, a conveying system to convey a substrate by moving the substrate holder, a process chamber in which the substrate is processed, a load-lock chamber in which the substrate is temporarily stays in conveying between the outside atmosphere and the process chamber, and an intermediate chamber provided between the process chamber and the load-lock chamber. The holding angle is the angle made of the substrate and the horizon. The conveying system conveys the substrate between the load-lock chamber and the intermediate chamber, and between the intermediate chamber and the process chamber. The conveying system conveys the substrate along the first direction that is the direction from the load-lock chamber to the intermediate chamber, or the direction from the intermediate chamber to the process chamber. The conveying system also conveys the substrate along the second direction that is perpendicular to the first direction.
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