发明名称 A SEMICONDUCTOR ISOTOPE SUPERLATTICE
摘要 <p>A 28Sin/30Sim supelattices (10) is grown on a substrate (11) where the thicknesses of the ?28Si and 30¿Si layers n and m, respectively, is in the unit of atomic layers. The 28Sin/30Sin superlattice (10) is composed of alternating layers of isotopically enriched ?28Si and 30¿Si layers in the crystallographic direction &lt;111&gt;. The number of periods, that is, the number of ?28Si and 30¿Si layer pairs in this embodiment, is two. The superlattice (10) is grown in a direction that is not parallel to the direction of the dominant intervalley electron scattering. The most preferred direction of the isotope superlattice for the case of Si is &lt;111&gt; since it has the same angles to the directions (A-B, C-C'', C'-C''').</p>
申请公布号 WO2002015279(A1) 申请公布日期 2002.02.21
申请号 AU2000000976 申请日期 2000.08.15
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