发明名称 METHOD AND CIRCUIT FOR CONTROLLING A PLASMA PANEL
摘要 <p>The invention concerns a method for controlling a matrix plasma panel cells, consisting of cells (4) arranged at the intersections of lines (6) and columns (8), comprising a step which consists in sequentially applying to each line an activating potential and, during a line activation, in applying an activation potential to selected columns, wherein while a line is being activated, the selected columns are activated non-simultaneously.</p>
申请公布号 WO2002015163(A1) 申请公布日期 2002.02.21
申请号 FR2001002590 申请日期 2001.08.09
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址