| 摘要 |
<p>A multi-chamber plasma reactor apparatus (20) having a plurality of sub-chambers (60, 460) that can be changed in size by adjusting (i.e., removing or re-arranging) adjustable sidewalls (50). Each sub-chamber has a plasma-generating segment (36) and an opposing chuck segment (40) and is capable of supporting a plasma (PL). At least one of the sidewalls preferably includes an inner wall portion (170) having a cavity (180) within which is stored a foldable substrates (S) between adjoining sub-chambers without having to open the plasma reactor apparatus. Methods of processing substrates using the apparatus of the invention are also provided.</p> |
