Semiconductor device and manufacturing method thereof

摘要

As wiring patterns in a region for connecting two line & space pattern sets having different line & space widths on a semiconductor substrate, even-numbered line patterns in a region having a smaller line & space width are connected to line patterns in a region having a larger line & space width and thicken their line widths stepwise in the middle of the lengthwise direction, and odd-numbered line patterns in the region having the smaller line & space width terminate at different positions in a connection region. Upon forming a fine wiring pattern on the connection region using photolithography, the resolution and depth of focus can be suppressed from impairing.